Direct patterning single-layer CVD graphene by oxidation scanning probe lithography.

Abstract

Single-layer graphene, with its atomic thickness and exceptional properties, offers great opportunities for high-performance nanoscale devices. While patterning is essential for translating the unique properties of graphene into functional devices, conventional ultraviolet (UV) lithography and electron-beam lithography (EBL) are constrained by limited resolution, resist residues and crystal damage. Here, we report nanoscale patterning of single-layer chemical vapor deposition (CVD) graphene using high-resolution, resist-free oxidation scanning probe lithography (o-SPL). By applying an alternating voltage to an electrically conductive probe, we demonstrate maskless, direct writing of graphene nanostructures on insulating substrates through the electrochemical reaction of graphene with water molecules. The dimensions of the patterned structures can be controlled by the voltage amplitude and probe scanning velocity, enabling single-layer graphene nanoribbons with widths down to ∼10 nm. This work highlights o-SPL as a precise and clean approach for patterning two-dimensional materials and functional devices.

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